Nanofabrication of highly sensitive and uniform molecular sensing substrates

Time 2015-11-13 10:30~11:00 Place Room 601+602
Code No. ME-I13 Session Chair
Name Dr. Sung-Gyu Park
Affiliation Korea Institute of Materials Science
Title Nanofabrication of highly sensitive and uniform molecular sensing substrates
Co-author-1PrefixDr.
CountryKorea
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Co-author-2PrefixDr.
CountryKorea
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Contents
Periodic metallic nanostructures have been studied extensively due to their potential applications for photonics, optofluidics and optoelectronics. Interference lithography (IL) has great potential for simple and rapid production of defect-free ordered nanostructures over large areas up to cm2 with one laser exposure. In IL, multi-beam optical interference produces multi-dimensional intensity profile of light in space. The interference-induced intensity profile can be transferred to photosensitive materials in very short exposure times. More importantly, IL allows for precise control of the feature size, pattern shift, and a variety of lattice symmetries through a proper arrangement of laser beams. Here, we report on the fabrication of the various metallic nanostructures for highly efficient and uniform plasmonic sensing applications. Highly ordered polymer nanostructures are generated by single prism IL, and following metal coating and lift-off processes can lead to the generation of 2D and 3D nanostructured plasmonic materials. Ridges on the structural surfaces along the z-direction were formed via the standing wave effects. Finally, we also briefly mention Ag nanowire-based surface-enhanced Raman spectroscopy (SERS) substrates.