Crack Photolithography for Nanopatterning and Nanofluidics

Time	2015-11-12 09:30~10:00	Place
Code No.	FB-I02	Session Chair
Name	Prof. Taesung Kim CV Eng CV Kor Abstract
Affiliation	Ulsan National Institute of Science and Technology
Title	Crack Photolithography for Nanopatterning and Nanofluidics

Co-author-1	Prefix	Dr.
	Country	Korea
	First name
	Last name
	Affiliation
	Department
	E-mail
	Cell phone

Co-author-2	Prefix	Mr.
	Country	Korea
	First name
	Last name
	Affiliation
	Department
	E-mail
	Cell phone

Contents
Cracks are observed in many environments, including walls, dried wood, and even the Earth’s crust, and are often thought of as an unavoidable, unwanted phenomenon. Recent research advances have demonstrated the capability of using cracks to produce various micro and nanoscale patterns. However, patterns are usually limited by the chosen substrate material and the applied tensile stresses. Here, we describe an innovative cracking-assisted nanofabrication technique that relies only on a standard photolithography process. This novel technique produces well-controlled nanopatterns in any desired shape and in a variety of geometric dimensions, over large areas and with a high-throughput. In addition, we show that mixed-scale patterns fabricated using the proposed technique can be used as master moulds for replicating numerous nanofluidic devices via soft lithography, which to the best of our knowledge is a technique that has not been reported in previous studies on materials’ mechanical failure, including cracking.

Contents

Cracks are observed in many environments, including walls, dried wood, and even the Earth’s crust, and are often thought of as an unavoidable, unwanted phenomenon. Recent research advances have demonstrated the capability of using cracks to produce various micro and nanoscale patterns. However, patterns are usually limited by the chosen substrate material and the applied tensile stresses. Here, we describe an innovative cracking-assisted nanofabrication technique that relies only on a standard photolithography process. This novel technique produces well-controlled nanopatterns in any desired shape and in a variety of geometric dimensions, over large areas and with a high-throughput. In addition, we show that mixed-scale patterns fabricated using the proposed technique can be used as master moulds for replicating numerous nanofluidic devices via soft lithography, which to the best of our knowledge is a technique that has not been reported in previous studies on materials’ mechanical failure, including cracking.