|Various applications are requiring and demanding the development of structures that are challenging for classical MEMS technologies. High aspect ratio nanosized structures and three-dimensional (3D) arrangements are among the most challenging. Development of technologies which allow fabricating such structures in a cost-efficient way and potentially for high-throughput replication processes are the key for the applications of tomorrow.
In order to fulfill these demands we have developed a number of technologies for polymer structuring based in the combination of different traditional techniques and methods, such as UV photolithography, electron-beam writing or nanoimprint lithography, with emerging ones, as cryo-etching, micro-ink jet printing or direct-write laser two-photon polymerization. This has allowed us to develop controlled 3D structural shapes for micro-optical applications (reflective pyramids and shape controlled microlenses) and novel high aspect ratio nanostructures (up to 1:45) for photonic devices and in particular for sensing applications. Three examples of such structures are presented in Figure 1. Detailed fabrication processes and characterization will be presented.